Photolithography Lab

Karl Suss MJB 3 Mask Aligner

The MJB 3 is designed for high resolution photolithography in a laboratory or pilot plant production. It offers flexibility in handling of irregularly shaped substrates of differing thickness as well as standard sized substrates up to 3” diameter. 

Capabilities:

·         Mask size: 2.5 inch 3 inch and 4 inch

·         Substrate sizes:  pieces to 75 mm

·         Range of alignment: X, Y ± 10mm and Theta ± 10°

·         Substrate movement is performed with high precision micrometers for X, Y, and Theta axis resolution of 0.1 μm

·         Alignment accuracy: 0.1μm for top side alignment (with 20x objectives)

·         Exposure modes: soft contact, hard contact, and vacuum contact

·         Print resolution:

o   Soft contact: 1.0 – 2.0 μm

o   Hard contact: 0.8 – 1.5 μm

o   Vacuum contact: 0.6 μm

·         350 mercury arc lap with a UV filters for 365 nm and 405 nm wavelength

Contact:

·         Dr. Nauman Zafar Butt, Electrical Engineering. nauman.butt@lums.edu.pk

·         Dr. Habib Ur Rehman, Chemistry. habib.rehman@lums.edu.pk

·         Abdul Mannan, Research Scientist. abdulmannan@lums.edu.pk